Fairfax,
VA,
United States
Type
Public
Degrees offered
Bachelor's Degree
Master of Laws (LLM) in Intellectual Property in Fairfax United States | George Mason University
George Mason University
|
Fairfax United States
Visit institution website
for more information
Qualification
Masters Degree
Languages
English
Delivery Mode
On-Campus
Tuition (2025)
USD
39,984
Attendance
Full-time
Full-time Duration
12 months
The Master of Laws (LLM) program specializing in Intellectual Property prepares legal professionals for careers in patent, copyright, trademark, and technology law. This comprehensive curriculum explores all facets of intellectual property, offering foundational courses in patents, copyrights, trademarks, and tech law, along with advanced studies in enforcement, litigation, dispute resolution, and hands-on patent drafting. Students can tailor their LLM by focusing specifically on patents or technology.
In today's era of rapid technological innovation, intellectual property law has become increasingly vital. Recent congressional activity has focused heavily on IP legislation, as well as regulations governing computer, communications, and biomedical technologies. Scalia Law provides unique opportunities for students to concentrate on the legal frameworks shaping emerging technologies through its specialized Intellectual Property LLM program.
Destination of Study
Subjects of Study
Language Requirements
English
IELTS 6.5
Qualification Requirements
A Juris Doctor (JD) degree from an ABA-accredited law school or an equivalent degree (a Bachelor of Laws, or LL.B.) from a law school outside the United States.
A minimum 3.00 GPA on a 4.00 scale in baccalaureate study.
For non-lawyers interested in the LLM in Intellectual Property (IP) Law: a Bachelor and a Masters degree in another field, accompanied by a minimum of four years work experience in IP may be accepted in lieu of a law degree. IP trainees, Patent Examiners (including Bengoshi) with four or more years of experience in IP are welcome to apply.
All applicants for admission must have demonstrated high academic standing, and professional achievements or positions indicating the applicant's capacity for performing master's-level work.
Official Undergraduate Transcript
TOEFL- Minimum of 90 in the iBT test (100 or above highly preferred)
IELTS- Minimum of 6.5 (7.5 or above highly preferred)
A minimum 3.00 GPA on a 4.00 scale in baccalaureate study.
For non-lawyers interested in the LLM in Intellectual Property (IP) Law: a Bachelor and a Masters degree in another field, accompanied by a minimum of four years work experience in IP may be accepted in lieu of a law degree. IP trainees, Patent Examiners (including Bengoshi) with four or more years of experience in IP are welcome to apply.
All applicants for admission must have demonstrated high academic standing, and professional achievements or positions indicating the applicant's capacity for performing master's-level work.
Official Undergraduate Transcript
TOEFL- Minimum of 90 in the iBT test (100 or above highly preferred)
IELTS- Minimum of 6.5 (7.5 or above highly preferred)
Tuition
USD
39,984